JPH0426102B2 - - Google Patents

Info

Publication number
JPH0426102B2
JPH0426102B2 JP58049308A JP4930883A JPH0426102B2 JP H0426102 B2 JPH0426102 B2 JP H0426102B2 JP 58049308 A JP58049308 A JP 58049308A JP 4930883 A JP4930883 A JP 4930883A JP H0426102 B2 JPH0426102 B2 JP H0426102B2
Authority
JP
Japan
Prior art keywords
group
alkyl group
substituted
aryl group
examples
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58049308A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59174831A (ja
Inventor
Shunichi Ishikawa
Teruo Nagano
Koji Tamoto
Fumiaki Shinozaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP58049308A priority Critical patent/JPS59174831A/ja
Priority to DE19843410387 priority patent/DE3410387A1/de
Priority to US06/592,196 priority patent/US4504573A/en
Priority to GB08407501A priority patent/GB2140431B/en
Publication of JPS59174831A publication Critical patent/JPS59174831A/ja
Publication of JPH0426102B2 publication Critical patent/JPH0426102B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/116Redox or dye sensitizer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/12Nitrogen compound containing
    • Y10S430/121Nitrogen in heterocyclic ring
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/122Sulfur compound containing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/127Spectral sensitizer containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP58049308A 1983-03-24 1983-03-24 光重合性組成物 Granted JPS59174831A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP58049308A JPS59174831A (ja) 1983-03-24 1983-03-24 光重合性組成物
DE19843410387 DE3410387A1 (de) 1983-03-24 1984-03-21 Photopolymerisierbare zusammensetzung
US06/592,196 US4504573A (en) 1983-03-24 1984-03-22 Photopolymerizable compositions
GB08407501A GB2140431B (en) 1983-03-24 1984-03-22 Photopolymerisation initiators

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58049308A JPS59174831A (ja) 1983-03-24 1983-03-24 光重合性組成物

Publications (2)

Publication Number Publication Date
JPS59174831A JPS59174831A (ja) 1984-10-03
JPH0426102B2 true JPH0426102B2 (en]) 1992-05-06

Family

ID=12827314

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58049308A Granted JPS59174831A (ja) 1983-03-24 1983-03-24 光重合性組成物

Country Status (4)

Country Link
US (1) US4504573A (en])
JP (1) JPS59174831A (en])
DE (1) DE3410387A1 (en])
GB (1) GB2140431B (en])

Families Citing this family (66)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3420425A1 (de) * 1984-06-01 1985-12-05 Hoechst Ag, 6230 Frankfurt Photopolymerisierbares gemisch, das als photoinitiator ein 1,3,10-triazaanthracen-4-on- enthaelt
DE3541534A1 (de) * 1985-11-25 1987-05-27 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch
DE3717034A1 (de) * 1987-05-21 1988-12-08 Basf Ag Photopolymerisierbare aufzeichnungsmaterialien sowie photoresistschichten und flachdruckplatten auf basis dieser aufzeichnungsmaterialien, sowie neue chinazolon-4-verbindungen
US4945027A (en) * 1987-10-23 1990-07-31 Hoechst Celanese Corporation 1,4 or 9,10 dimethoxyanthracene triggers for 2-tri(chloro or bromo)methyl-4(1H)-quinazolimone polymerization initiators
JP2547627B2 (ja) * 1988-10-07 1996-10-23 富士写真フイルム株式会社 ポジ型感光性組成物
US5217847A (en) * 1989-10-25 1993-06-08 Hercules Incorporated Liquid solder mask composition
JP2632069B2 (ja) * 1990-04-17 1997-07-16 富士写真フイルム株式会社 光重合性組成物
GB9424842D0 (en) * 1994-12-09 1995-02-08 British Tech Group Pharmaceutical compositions
JP3442176B2 (ja) 1995-02-10 2003-09-02 富士写真フイルム株式会社 光重合性組成物
JP4130030B2 (ja) 1999-03-09 2008-08-06 富士フイルム株式会社 感光性組成物および1,3−ジヒドロ−1−オキソ−2h−インデン誘導体化合物
JP4291638B2 (ja) 2003-07-29 2009-07-08 富士フイルム株式会社 アルカリ可溶性ポリマー及びそれを用いた平版印刷版原版
JP4452572B2 (ja) 2004-07-06 2010-04-21 富士フイルム株式会社 感光性組成物およびそれを用いた画像記録方法
JP5089866B2 (ja) 2004-09-10 2012-12-05 富士フイルム株式会社 平版印刷方法
EP1701213A3 (en) 2005-03-08 2006-11-22 Fuji Photo Film Co., Ltd. Photosensitive composition
JP4474317B2 (ja) 2005-03-31 2010-06-02 富士フイルム株式会社 平版印刷版の作製方法
JP2006335826A (ja) 2005-05-31 2006-12-14 Fujifilm Holdings Corp インクジェット記録用インク組成物およびこれを用いた平版印刷版の作製方法
JP5276264B2 (ja) 2006-07-03 2013-08-28 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、平版印刷版の製造方法
JP2008163081A (ja) 2006-12-27 2008-07-17 Fujifilm Corp レーザー分解性樹脂組成物およびそれを用いるパターン形成材料ならびにレーザー彫刻型フレキソ印刷版原版
EP1952998B1 (en) 2007-02-01 2011-04-06 FUJIFILM Corporation Ink-jet recording device
US8541063B2 (en) 2007-02-06 2013-09-24 Fujifilm Corporation Undercoat solution, ink-jet recording method and ink-jet recording device
DE602008006279D1 (de) 2007-02-07 2011-06-01 Fujifilm Corp Tintenstrahlaufzeichnungsvorrichtung mit Wartungsvorrichtung für Tintenstrahldruckkopf und Wartungsverfahren für einen Tintenstrahldruckkopf
JP5227521B2 (ja) 2007-02-26 2013-07-03 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、インクセット
JP5224699B2 (ja) 2007-03-01 2013-07-03 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び平版印刷版
JP5238292B2 (ja) 2007-03-23 2013-07-17 三菱製紙株式会社 水現像可能な感光性平版印刷版材料
JP5306681B2 (ja) 2007-03-30 2013-10-02 富士フイルム株式会社 重合性化合物、重合体、インク組成物、印刷物及びインクジェット記録方法
JP5243072B2 (ja) 2007-03-30 2013-07-24 富士フイルム株式会社 インク組成物、並びに、それを用いた画像記録方法及び画像記録物
JP4898618B2 (ja) 2007-09-28 2012-03-21 富士フイルム株式会社 インクジェット記録方法
JP5227560B2 (ja) 2007-09-28 2013-07-03 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、成形印刷物の製造方法
JP5265165B2 (ja) 2007-09-28 2013-08-14 富士フイルム株式会社 塗布装置及びこれを用いるインクジェット記録装置
EP2058123B1 (en) 2007-11-08 2012-09-26 FUJIFILM Corporation Resin printing plate precursor for laser engraving, relief printing plate and method for production of relief printing plate
JP5500831B2 (ja) 2008-01-25 2014-05-21 富士フイルム株式会社 レリーフ印刷版の作製方法及びレーザー彫刻用印刷版原版
JP5241252B2 (ja) 2008-01-29 2013-07-17 富士フイルム株式会社 レーザー彫刻用樹脂組成物、レーザー彫刻用レリーフ印刷版原版、レリーフ印刷版及びレリーフ印刷版の製造方法
JP5254632B2 (ja) 2008-02-07 2013-08-07 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、成形印刷物
US20090214797A1 (en) 2008-02-25 2009-08-27 Fujifilm Corporation Inkjet ink composition, and inkjet recording method and printed material employing same
JP5137618B2 (ja) 2008-02-28 2013-02-06 富士フイルム株式会社 レーザー彫刻用樹脂組成物、レーザー彫刻用レリーフ印刷版原版、レリーフ印刷版及びレリーフ印刷版の製造方法
EP2095970A1 (en) 2008-02-29 2009-09-02 Fujifilm Corporation Resin composition for laser engraving, resin printing plate precursor for laser engraving, relief printing plate and method for production of relief printing plate
JP5583329B2 (ja) 2008-03-11 2014-09-03 富士フイルム株式会社 顔料組成物、インク組成物、印刷物、インクジェット記録方法、及びポリアリルアミン誘導体
JP4914862B2 (ja) 2008-03-26 2012-04-11 富士フイルム株式会社 インクジェット記録方法、及び、インクジェット記録装置
JP5322575B2 (ja) 2008-03-28 2013-10-23 富士フイルム株式会社 レーザー彫刻用樹脂組成物、画像形成材料、レーザー彫刻用レリーフ印刷版原版、レリーフ印刷版、及びレリーフ印刷版の製造方法
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JP5383133B2 (ja) 2008-09-19 2014-01-08 富士フイルム株式会社 インク組成物、インクジェット記録方法及び印刷物成形体の製造方法
JP2010077228A (ja) 2008-09-25 2010-04-08 Fujifilm Corp インク組成物、インクジェット記録方法、及び、印刷物
JP2010180330A (ja) 2009-02-05 2010-08-19 Fujifilm Corp 非水系インク、インクセット、画像記録方法、画像記録装置、および記録物
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JP5383289B2 (ja) 2009-03-31 2014-01-08 富士フイルム株式会社 インク組成物、インクジェット用であるインク組成物、インクジェット記録方法、およびインクジェット法による印刷物
JP5572026B2 (ja) 2009-09-18 2014-08-13 富士フイルム株式会社 インク組成物、及び、インクジェット記録方法
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DE112011101165T5 (de) 2010-03-29 2013-03-28 Mitsubishi Paper Mills Limited Fotoempfindliche Zusammensetzung und fotoempfindliches lithographisches Druckplattenmaterial
JP2012031388A (ja) 2010-05-19 2012-02-16 Fujifilm Corp 印刷方法、オーバープリントの作製方法、ラミネート加工方法、発光ダイオード硬化性コーティング組成物、及び、発光ダイオード硬化性インク組成物
EP2644664B1 (en) 2012-03-29 2015-07-29 Fujifilm Corporation Actinic radiation-curing type ink composition, inkjet recording method, decorative sheet, decorative sheet molded product, process for producing in-mold molded article, and in-mold molded article
JP5980702B2 (ja) 2013-03-07 2016-08-31 富士フイルム株式会社 インクジェットインク組成物、インクジェット記録方法、及び、成型印刷物の製造方法
JP5939644B2 (ja) 2013-08-30 2016-06-22 富士フイルム株式会社 画像形成方法、インモールド成型品の製造方法、及び、インクセット
JP7105786B2 (ja) 2017-01-31 2022-07-25 フリント グループ ジャーマニー ゲーエムベーハー 低官能化され部分ケン化されたポリ酢酸ビニルを含む放射線硬化性混合物
JP2020515431A (ja) 2017-03-27 2020-05-28 フリント グループ ジャーマニー ゲーエムベーハー 画像レリーフ構造の製造方法
US11822246B2 (en) 2017-10-10 2023-11-21 Flint Group Germany Gmbh Relief precursor having low cupping and fluting
CN117031883A (zh) 2017-12-08 2023-11-10 恩熙思德国有限公司 识别用于制造凸版结构的凸版前体的方法
NL2020109B1 (en) 2017-12-18 2019-06-25 Xeikon Prepress Nv Method for fixing and treating a flexible plate on a drum, and flexible plate for use therein
EP3629089A1 (en) 2018-09-26 2020-04-01 Flint Group Germany GmbH Method for thermally developing relief precursors
NL2027003B1 (en) 2020-11-27 2022-07-04 Flint Group Germany Gmbh Photosensitive composition
NL2027002B1 (en) 2020-11-27 2022-07-04 Flint Group Germany Gmbh Photosensitive composition
NL2028208B1 (en) 2021-05-12 2022-11-30 Flint Group Germany Gmbh Flexographic printing element precursor with high melt flow index
NL2028207B1 (en) 2021-05-12 2022-11-30 Flint Group Germany Gmbh A relief precursor with vegetable oils as plasticizers suitable for printing plates
NL2035286B1 (en) 2023-07-06 2025-01-13 Xsys Germany Gmbh Relief precursors with enhanced stability

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE551487A (en]) * 1953-12-11
DE2850585A1 (de) * 1978-11-22 1980-06-04 Hoechst Ag Photopolymerisierbares gemisch
JPS55118030A (en) * 1979-03-06 1980-09-10 Fuji Photo Film Co Ltd Photopolymerizable composition
JPS5753747A (ja) * 1980-09-17 1982-03-30 Fuji Photo Film Co Ltd Hikarijugoseisoseibutsu

Also Published As

Publication number Publication date
JPS59174831A (ja) 1984-10-03
GB2140431B (en) 1986-09-17
GB8407501D0 (en) 1984-05-02
US4504573A (en) 1985-03-12
DE3410387C2 (en]) 1991-01-03
GB2140431A (en) 1984-11-28
DE3410387A1 (de) 1984-10-04

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